A face mask having a one-way valve

Publication Date

Patent Number

JP5312472B2

Abstract

The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.001% to about 5% of an antimicrobial active, from about 1% to about 80% of an anionic surfactant, from about 0.1% to about 12% of a proton donating agent; and from about 3% to about 98.899% of water, wherein the composition is adjusted to a pH of from about 3.0 to about 6.0, wherein the rinse-off antimicrobial cleansing composition has a Gram Positive Residual Effectiveness Index of greater than about 1.8, and wherein the rinse-off antimicrobial cleansing composition has a Mildness Index of greater than 0.3. The invention also encompasses methods for cleansing skin and providing residual effectiveness versus Gram positive bacteria using these products.

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